A capacitive probe with shaped probe bias for ion flux measurements in depositing plasmas

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A capacitive probe with shaped probe bias for ion flux measurements in depositing plasmas.

The application of a pulse shaped biasing method implemented to a capacitive probe is described. This approach delivers an accurate and simple way to determine ion fluxes in diverse plasma mixtures. To prove the reliability of the method, the ion probe was used in a different configuration, namely, a planar Langmuir probe. In this configuration, the ion current was directly determined from the ...

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ژورنال

عنوان ژورنال: Review of Scientific Instruments

سال: 2008

ISSN: 0034-6748,1089-7623

DOI: 10.1063/1.3020709